This repository contains a test artifact (TA), also called test structure, designed for two-photon polymerization (also known as Direct Laser Writing (DLW) or Two/Multi-photon lithography (2PA/MPA)). Test artifacts can be used to compare structures, to check options used by the slicer, check the state of the 2PP machine itself or to get a construction guidelines for a certain combination of power, velocity and settings.

General ideas behind the test artifact:

• optimized for 2PP-DLW
• should be fast and easy to analyse with optical microscopy or scanning electron microscopy without tilt.
• short time to fabricate
• include a reasonable amount of different features
• bulk and small structures on the substrate

The model of the test artifact can be downloaded as .STL-file or .3mf-file from this repository.

Please note that the length are defined in Millimeters and have to be scaled according to your usage.

The following features are integrated in the current version of the test artifact.

This work is currently available as preprint here: https://www.preprints.org/manuscript/202210.0259/v1

Please cite this work as:

Fritzsche, S.; Pauw, B.R.; Weimann, C.; Sturm, H. First of its Kind: A Test Artifact for Direct Laser Writing. Preprints 2022, 2022100259 (doi: 10.20944/preprints202210.0259.v1).

After peer-review this part will be changed.

• independent individual features so they can be fabricated alone
• include a complex structure